Knowledge Management System of Institute of Theoretical Physics, CAS
| Shen, G; Meng, J; Hillhouse, GC; Shen, G , Peking Univ, Sch Phys, Beijing 100871, Peoples R China. | |
| Direct URCA process in neutron stars | |
| Source Publication | HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION
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| Keyword | Halo |
| Abstract | The onset of the most powerful neutrino emission candidate in the cooling of neutron stars, direct URCA process, requires a high threshold proton fraction. The proton fraction in neutron stars relies on the isospin dependent part of nuclear force, which can be constrained by the measurement of the neutron skin thickness in heavy nuclei such as Pb-208. Adding new isospin dependent correction terms to the effective interactions PK1, NL3, S271 and Z271, the correlation between the proton fraction and neutron skin thickness in Pb-208 is studied. For a neutron star with fixed mass, the central proton fraction increases with increasing predicted values of neutron skin thickness in Pb-208. |
| 2004 | |
| ISSN | 0254-3052 |
| Volume | 28Issue:0Pages:99-101 |
| Subject Area | Physics |
| Indexed By | SCI |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.itp.ac.cn/handle/311006/13943 |
| Collection | 理论物理所科研产出_SCI论文 |
| Corresponding Author | Shen, G , Peking Univ, Sch Phys, Beijing 100871, Peoples R China. |
| Recommended Citation GB/T 7714 | Shen, G,Meng, J,Hillhouse, GC,et al. Direct URCA process in neutron stars[J]. HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,2004,28(0):99-101. |
| APA | Shen, G,Meng, J,Hillhouse, GC,&Shen, G , Peking Univ, Sch Phys, Beijing 100871, Peoples R China..(2004).Direct URCA process in neutron stars.HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,28(0),99-101. |
| MLA | Shen, G,et al."Direct URCA process in neutron stars".HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION 28.0(2004):99-101. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| Direct URCA Process （201KB） | 开放获取 | License | Application Full Text | |||
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