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题名: Effect of Phantom Dark Energy on Holographic Thermalization
作者: Zeng, XX ;  Hu, XY ;  Li, LF
刊名: CHINESE PHYSICS LETTERS
出版日期: 2017
卷号: 34, 期号:1, 页码:10401
学科分类: Physics
DOI: http://dx.doi.org/10.1088/0256-307X/34/1/010401
通讯作者: Hu, XY (reprint author), Chongqing Jiaotong Univ, Sch Econ & Management, Chongqing 400074, Peoples R China.
文章类型: Article
英文摘要: Holographic thermalization for a black hole surrounded by phantom dark energy is probed. The result shows that the smaller the phantom dark energy parameter is, the easier the is plasma to thermalize as the chemical potential is fixed, the larger the chemical potential is, and the harder the plasma is to thermalize as the dark energy parameter is fixed. The thermalization velocity and thermalization acceleration are presented by fitting the thermalization curves.
类目[WOS]: Physics, Multidisciplinary
项目资助者: National Natural Science Foundation of China [11405016, 11365008] ;  China Postdoctoral Science Foundation [2016M590138]
语种: 英语
Citation statistics: 
内容类型: 期刊论文
URI标识: http://ir.itp.ac.cn/handle/311006/22163
Appears in Collections:理论物理所2017年知识产出_期刊论文

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Recommended Citation:
Zeng, XX,Hu, XY,Li, LF. Effect of Phantom Dark Energy on Holographic Thermalization[J]. CHINESE PHYSICS LETTERS,2017,34(1):10401.
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