ITP OpenIR  > SCI期刊论文
Xu, Xinpeng1; Man, Xingkun2,3; Doi, Masao2,3; Ou-Yang, Zhong-can; Andelman, David5
Defect Removal by Solvent Vapor Annealing in Thin Films of Lamellar Diblock Copolymers
Source PublicationMACROMOLECULES
Language英语
KeywordBLOCK POLYMER-SOLUTIONS PHASE-SEPARATION DILUTION APPROXIMATION ORDERED STRUCTURE ANNIHILATION ORIENTATION EVAPORATION SIMULATION DYNAMICS KINETICS
AbstractSolvent vapor annealing (SVA) is known to be a simple, low-cost, and highly efficient technique to produce defect-free diblock copolymer (BCP) thin films. Not only can the solvent weaken the BCP segmental interactions but it can also vary the characteristic spacing of the BCP microstructures. We carry out systematic theoretical studies on the effect of adding a solvent into lamellar BCP thin films on the defect removal close to the BCP order-disorder transition. We find that the increase of the lamellar spacing, as is induced by addition of the solvent, facilitates more efficient removal of defects. The stability of a particular defect in a lamellar BCP thin film is given in terms of two key controllable parameters: the amount of BCP swelling and the solvent-evaporation rate. Our results highlight the SVA mechanism for obtaining defect-free BCP thin films, as is highly desired in nanolithography and other industrial applications.
2019
ISSN0024-9297
Volume52Issue:23Pages:9321-9333
Cooperation Status国际
Subject AreaPolymer Science
MOST Discipline CataloguePolymer Science
DOI10.1021/acs.macromol.9b01181
Indexed BySCIE
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Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.itp.ac.cn/handle/311006/26954
CollectionSCI期刊论文
Affiliation1.Guangdong Technion Israel Inst Technol, Phys Program, Shantou 515063, Guangdong, Peoples R China
2.Technion Israel Inst Technol, IL-32000 Haifa, Israel
3.Beihang Univ, Ctr Soft Matter Phys & Its Applicat, Beijing 100191, Peoples R China
4.Beihang Univ, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R China
5.Chinese Acad Sci, Inst Theoret Phys, CAS Key Lab Theoret Phys, Beijing 100190, Peoples R China
6.Tel Aviv Univ, Raymond & Beverly Sadder Sch Phys & Astron, IL-69978 Tel Aviv, Israel
Recommended Citation
GB/T 7714
Xu, Xinpeng,Man, Xingkun,Doi, Masao,et al. Defect Removal by Solvent Vapor Annealing in Thin Films of Lamellar Diblock Copolymers[J]. MACROMOLECULES,2019,52(23):9321-9333.
APA Xu, Xinpeng,Man, Xingkun,Doi, Masao,Ou-Yang, Zhong-can,&Andelman, David.(2019).Defect Removal by Solvent Vapor Annealing in Thin Films of Lamellar Diblock Copolymers.MACROMOLECULES,52(23),9321-9333.
MLA Xu, Xinpeng,et al."Defect Removal by Solvent Vapor Annealing in Thin Films of Lamellar Diblock Copolymers".MACROMOLECULES 52.23(2019):9321-9333.
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